35 contacts qualifiés sélectionnés parmi 80+ identifiés — ingénieurs process, chercheurs, équipementiers et chefs de laboratoire dans les organisations les plus pertinentes pour les équipements MDC (QuietCHUCK, Mercury Probe).
| # | Nom | Organisation | Poste | Score | Produit |
|---|---|---|---|---|---|
| 001 | Frédéric Glowacki Furnace Process Engineer |
STMicroelectronics 🇫🇷 Crolles 300mm |
Cible #1 Séq. B — fournaises contamination | 10 |
QuietCHUCK |
| 002 | Klaus Hirschfelder Senior Process Engineer |
Infineon Technologies 🇩🇪 Dresden |
Furnace Operations — contamination ionique | 10 |
QuietCHUCK |
| 003 | Stefan Kircher Oxidation Process Engineer |
Infineon Technologies 🇩🇪 Dresden Smart Power Fab |
CVBT measurement · process control | 10 |
QuietCHUCK |
| 004 | Thomas Zorn Furnace Process Engineer |
GlobalFoundries 🇩🇪 Dresden Fab1 |
Mobile ion monitoring — GF FDSOI | 10 |
QuietCHUCK |
| 005 | Jana Hoffmann Equipment Engineer |
X-FAB 🇩🇪 Erfurt (Chips Act) |
Furnace & Diffusion — nouvelle fab expansion | 10 |
QuietCHUCK |
| 006 | Luca Sementa Process Control Engineer |
STMicroelectronics 🇮🇹 Catania SiC |
SiC contamination monitoring — nouvelle fab | 10 |
QuietCHUCK |
| 007 | Patrick Bove Process Engineer |
ams-OSRAM 🇦🇹 Premstätten (Chips Act) |
Gate Dielectric — fab approuvée Chips Act | 10 |
QuietCHUCK |
| 008 | Petra Weniger Characterization Engineer |
Infineon 🇩🇪 Regensburg |
Power Devices — C-V measurements | 9 |
Both |
| 009 | Sylvain Delage Research Director |
MACOM / OMMIC 🇫🇷 Limeil-Brévannes |
III-V — GaAs/InP C-V native oxide | 9 |
Both |
| 010 | Ioannis Gousidou Process Engineer |
STMicroelectronics 🇫🇷 Crolles |
Diffusion & Oxidation — CVBT prioritaire | 9 |
QuietCHUCK |
| # | Nom | Organisation | Poste | Score | Produit |
|---|---|---|---|---|---|
| 011 | Anton Bauer Research Engineer — SiC |
Fraunhofer IISB 🇩🇪 Erlangen |
SiC Device Characterization · iRel40 | 10 |
Both |
| 012 | Nicolas Posseme Senior Engineer |
CEA-Leti 🇫🇷 Grenoble MINATEC |
Etching & Interface Characterization — C-V | 9 |
Both |
| 013 | Marie Luong Lab Manager |
CEA-Leti 🇫🇷 Grenoble LCEF |
Electrical Characterization Lab — LCEF | 9 |
Both |
| 014 | Nadine Adjeroud Senior R&D Engineer |
imec 🇧🇪 Leuven |
MOS Reliability — BTS — interface traps | 9 |
QuietCHUCK |
| 015 | Kris Decock R&D Engineer |
imec 🇧🇪 Leuven |
Device Characterization — C-V measurements | 9 |
Both |
| 016 | Pieter Neutens R&D Engineer |
imec 🇧🇪 Leuven |
Device Electrical Characterization | 9 |
Both |
| 017 | Bruno Belier Research Engineer |
C2N Paris-Saclay 🇫🇷 Palaiseau |
MOS & Thin Film Characterization — CNRS | 9 |
Both |
| 018 | Thomas Erlbacher Head of Department |
Fraunhofer IISB 🇩🇪 Erlangen |
Semiconductor Devices — SiC C-V MOS | 9 |
Both |
| 019 | Adrian Ionescu Professor |
EPFL 🇨🇭 Lausanne |
Nanoelectronics Lab — MOSFET MOS · NANO-TERA | 9 |
Both |
| 020 | Elison Matioli Professor |
EPFL 🇨🇭 Lausanne |
Power & Wide Bandgap — GaN 2DEG | 9 |
Both |
| 021 | Thomas Mikolajick Director NaMLab |
TU Dresden 🇩🇪 Dresden |
NaMLab — thin oxide HfO2 C-V Ferroelectric | 9 |
Both |
| 022 | Guido Groeseneken Professor |
KU Leuven / imec 🇧🇪 Leuven |
Reliability MOS — BTS — C-V — pont KUL/imec | 9 |
Both |
| 023 | Cora Salm Associate Professor |
University of Twente 🇳🇱 Enschede |
Reliability & MOS Characterization — NBTI | 9 |
Both |
| 024 | Daniel Bauza Professor Emeritus |
Grenoble INP G2Elab 🇫🇷 Grenoble |
Expert C-V — interface traps — dit-V method | 9 |
Both |
| 025 | Roland Simon Senior Engineer |
Soitec 🇫🇷 Bernin (OEM) |
SmartSiC Characterization — C-V benchmarking | 9 |
Both |
| # | Nom | Organisation | Poste | Score | Produit |
|---|---|---|---|---|---|
| 026 | Marcus Wendt Thermal Process Manager |
Centrotherm 🇩🇪 Blaubeuren |
Fournaises diffusion/oxydation — contamination control | 9 |
QuietCHUCK |
| 027 | Takeshi Nakamura European Sales Director |
Koyo Thermo Systems 🇩🇪 Munich (EU HQ) |
Vertical furnaces — partenariat contamination | 9 |
QuietCHUCK |
| 028 | Frank Schulze Product Manager Diffusion |
Tokyo Electron (TEL) 🇩🇪 Dresden |
Batch furnaces — ALPHA series — mobile ion QC | 9 |
QuietCHUCK |
| 029 | Jürgen Weber Application Engineer |
ASM International 🇳🇱 Almere |
ALD/CVD — gate oxide process — contamination specs | 9 |
QuietCHUCK |
| 030 | Philippe Music VP Epitaxy Products |
Aixtron SE 🇩🇪 Herzogenrath |
MOCVD GaN/SiC — C-V characterization substrats | 9 |
Both |
| 031 | Andrea Lupi Process Engineer |
LPE Epitaxial Technology 🇮🇹 Baranzate (Milan) |
SiC epitaxy — substrate quality C-V monitoring | 9 |
Both |
| 032 | Henrik Larsson Senior Application Scientist |
Veeco Instruments 🇩🇪 Aachen (EU office) |
MBE/MOCVD — interface quality — C-V validation | 8 |
Both |
| 033 | Martin Kessler Metrology Product Manager |
KLA Corporation 🇩🇪 Weilburg |
Process control — inline C-V measurement integration | 8 |
Mercury Probe |
| 034 | Florian Berger Wafer Quality Engineer |
Siltronic AG 🇩🇪 Burghausen |
300mm Si wafer — contamination specs incoming | 8 |
QuietCHUCK |
| 035 | Chen Wei Zhang EU Business Development |
GlobalWafers (Siltronic) 🇩🇪 Munich |
Wafer supply chain — QC contamination standards | 8 |
QuietCHUCK |